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SRD Series

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Product description

1.Product Introduction

SRD series products are PV direct imaging R&D platforms with high-precision resolution and alignment, suitable for high-efficiency solar cell graphic R&D applications.
The system adopts DMD technology, which can realize better than 6μm fine lines through high-precision data analysis, and has good process adaptability to dry film, ink and photoresist, making it an economical and flexible R&D equipment platform.


2.Product Features


  • Direct writing lithography without mask, non-contact exposure process;
  • 405nm semiconductor laser, low exposure dose without substrate laser damage;
  • High resolution accuracy, better than 6 micron resolution accuracy.
  • Alignment accuracy: gripping edge alignment ± 0.05mm, Mark high-precision alignment ± 10μm.
  • Substrate size up to 300mm*300mm, suitable for 166~210 whole as well as half cells;
  • Automatic alignment function, compatible with gripping point and gripping edge alignment;
  • Multiple data input formats (GDSⅡ/DXF/Gerber etc.)
  • Windows-based system, user interface is easy to operate





Model PV SRD
06 08
Substrate size 166 mm~210mm Whole or half battery
Substrate thickness 80~150μm
Resolution 6μm 8μm
CDU ±10% ±10%
DOF ±30μm ±50μm
Alignment Edge alignment ±50μm
Mark alignment ±8μm
Edge alignment ±50μm
Mark alignment ±10μm
Light Source LD 405±10nm
Stitching ±1μm
Energy uniformity ≥95%
Light source lifetime 10000H

  *  After development, the minimum line width/line distance and depth of field depend on the characteristics of the photosensitive material and the process

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